10x10mm Nonpolar M-ndege Aluminium Substrate

Tsanangudzo Pfupi:

10x10mm Nonpolar M-ndege Aluminium Substrate-Yakanakira yepamberi optoelectronic application, inopa yepamusoro crystalline mhando uye kugadzikana mune compact, yakakwirira-chaiyo fomati.


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Semicera's10x10mm Nonpolar M-ndege Aluminium Substrateyakagadzirwa zvine hungwaru kuti isangane nezvinodiwa chaizvo zvepamberi optoelectronic application. Iyi substrate ine nonpolar M-ndege yekutarisa, iyo yakakosha kudzikisa polarization mhedzisiro mumidziyo yakaita se LEDs uye laser diode, zvichitungamira mukusimudzira mashandiro uye kugona.

The10x10mm Nonpolar M-ndege Aluminium SubstrateYakagadzirwa neyakasiyana-siyana yekristaro mhando, ichivimbisa kushoma kuremara densities uye yepamusoro yemaitiro kutendeseka. Izvi zvinoita kuti ive sarudzo yakanaka yekukura epitaxial yemhando yepamusoro III-nitride mafirimu, ayo akakosha pakugadzirwa kwechizvarwa chinotevera optoelectronic zvishandiso.

Semicera's precision engineering inovimbisa kuti imwe neimwe10x10mm Nonpolar M-ndege Aluminium Substrateinopa ukobvu hunoenderana uye kupfava kwepasi, izvo zvakakosha pakuiswa kwemafirimu yunifomu uye kugadzira mudziyo. Pamusoro pezvo, iyo substrate's compact size inoita kuti ive yakakodzera kune ese ari maviri ekutsvagisa uye ekugadzira nharaunda, achibvumira kushandiswa kunoshanduka mumhando dzakasiyana dzekushandisa. Nekugadzikana kwayo kwakanyanya kupisa uye kemikari, iyi substrate inopa hwaro hwakavimbika hwekuvandudzwa kwekucheka-kumucheto optoelectronic tekinoroji.

Items

Kugadzirwa

Tsvakurudzo

Dummy

Crystal Parameters

Polytype

4H

Kutadza kwekutarisa pamusoro

<11-20 >4±0.15°

Electrical Parameters

Dopant

n-mhando Nitrogen

Resistivity

0.015-0.025ohm·cm

Mechanical Parameters

Diameter

150.0±0.2mm

Ukobvu

350±25 μm

Primary flat orientation

[1-100]±5°

Primary flat urefu

47.5±1.5mm

Secondary flat

Hapana

TTV

≤5 μm

≤10 μm

≤15 μm

LTV

≤3 μm(5mm*5mm)

≤5 μm(5mm*5mm)

≤10 μm(5mm*5mm)

Bow

-15μm ~ 15μm

-35μm ~ 35μm

-45μm ~ 45μm

Warp

≤35 μm

≤45 μm

≤55 μm

Mberi(Si-face) roughness(AFM)

Ra≤0.2nm (5μm*5μm)

Chimiro

Micropipe density

<1 pa/cm2

<10 ea/cm2

<15 ea/cm2

Metal tsvina

≤5E10atomu/cm2

NA

BPD

≤1500 ea/cm2

≤3000 ea/cm2

NA

TSD

≤500 ea/cm2

≤1000 ea/cm2

NA

Mberi Hunhu

Mberi

Si

Surface finish

Si-face CMP

Zvimedu

≤60ea/wafer (saizi≥0.3μm)

NA

Makwara

≤5ea/mm. Kureba kwekuwedzera ≤Diameter

Cumulative kureba≤2*Diameter

NA

Orenji svuura/makomba/mavara/mitsetse/pakatsemuka/kusvibiswa

Hapana

NA

Edge chips/indents/fracture/hex plates

Hapana

Polytype nzvimbo

Hapana

Cumulative area≤20%

Cumulative area≤30%

Front laser marking

Hapana

Back Quality

Back finish

C-chiso CMP

Makwara

≤5ea/mm,Cumulative kureba≤2*Diameter

NA

Kuremara kumashure (kumucheto machipisi / indents)

Hapana

Back roughness

Ra≤0.2nm (5μm*5μm)

Back laser marking

1 mm (kubva kumusoro kumucheto)

Edge

Edge

Chamfer

Packaging

Packaging

Epi-yakagadzirira ine vacuum packaging

Multi-wafer kaseti kurongedza

* Notes: "NA" zvinoreva kuti hapana chikumbiro Zvinhu zvisina kutaurwa zvinogona kureva SEMI-STD.

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SiC wafers

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