Atomic layer deposition (ALD) ikemikari vapor deposition tekinoroji inokura mafirimu matete akaturikidzana nekuisa jekiseni maviri kana anopfuura anotangira mamorekuru. ALD ine mabhenefiti epamusoro kudzora uye kufanana, uye inogona kushandiswa zvakanyanya mumasemiconductor zvishandiso, optoelectronic zvishandiso, magetsi ekuchengetedza magetsi uye mamwe minda. Nheyo dzekutanga dzeALD dzinosanganisira precursor adsorption, pamusoro pekuita uye ne-chigadzirwa kubviswa, uye akawanda-layer zvinhu zvinogona kuumbwa nekudzokorora matanho aya mukutenderera. ALD ine hunhu uye mabhenefiti epamusoro controllability, kufanana, uye isiri-porous dhizaini, uye inogona kushandiswa pakuisa kwakasiyana-siyana substrate zvinhu uye zvakasiyana zvinhu.
ALD ine zvinotevera maitiro uye zvakanakira:
1. High controllability:Sezvo ALD iri dhizaini-ne-layer yekukura maitiro, ukobvu uye kuumbwa kwega rega rezvinhu zvinogona kudzorwa nemazvo.
2. Kufanana:ALD inogona kuisa zvinhu zvakafanana pane yese substrate pamusoro, ichidzivirira kusaenzana kunogona kuitika mune mamwe matekinoroji ekuisa.
3. Chimiro chisina porous:Sezvo ALD ichiiswa muzvikamu zveatomu rimwe chete kana mamorekuru mamwechete, firimu rinobuda rinowanzova nedense, isina-porous chimiro.
4. Kuita kwakanaka kwekuvhara:ALD inogona kunyatsovhara yakakwira chikamu ratio zvimiro, senge nanopore arrays, yakakwirira porosity zvinhu, nezvimwe.
5. Scalability:ALD inogona kushandiswa kune dzakasiyana siyana substrate zvinhu, zvinosanganisira simbi, semiconductors, girazi, nezvimwe.
6. Kuita zvakasiyana-siyana:Nekusarudza akasiyana precursor mamorekuru, akasiyana emhando dzakasiyana anogona kuiswa muALD maitiro, akadai sesimbi oxides, sulfides, nitrides, nezvimwe.