Nhanganyaya kuCVD TaC Coating:
CVD TaC Coating i tekinoroji inoshandisa kemikari vapor deposition kuisa tantalum carbide (TaC) yekuputira pamusoro pe substrate. Tantalum carbide ndeyepamusoro-inoshanda ceramic zvinhu ine yakanakisa mechaniki uye makemikari zvimiro. Iyo CVD maitiro inogadzira yunifomu yeTaC firimu pamusoro peiyo substrate kuburikidza negasi maitiro.
Main features:
Excellent kuoma uye kupfeka kuramba: Tantalum carbide ine kuomarara kwakanyanya, uye CVD TaC Coating inogona kuvandudza zvakanyanya kupfeka kuramba kweiyo substrate. Izvi zvinoita kuti iyo yekuputira ive yakanaka kune maapplication munzvimbo dzepamusoro-soro, senge maturusi ekucheka uye mold.
High Temperature Kugadzikana: TaC coatings inodzivirira yakakosha choto uye reactor zvikamu pakupisa kusvika ku2200 ° C, zvichiratidza kugadzikana kwakanaka. Inochengetedza kugadzikana kwemakemikari uye mechanical pasi pemamiriro ekushisa kwakanyanya, zvichiita kuti ive yakakodzera kune-high-temperature yekugadzirisa uye kushandiswa munzvimbo dzepamusoro-soro.
Yakanakisa kugadzikana kwemakemikari: Tantalum carbide ine yakasimba corrosion resistance kune akawanda acids uye alkalis, uye CVD TaC Coating inogona kudzivirira zvinobudirira kukanganisa kune substrate munzvimbo dzinoparadza.
High melting point: Tantalum carbide ine nzvimbo yakakwirira yekunyunguduka (inenge 3880 ° C), ichibvumira CVD TaC Coating kuti ishandiswe mumamiriro ekupisa kwepamusoro pasina kunyunguduka kana kukanganisa.
Excellent thermal conductivity: TaC coating ine high thermal conductivity, iyo inobatsira kunyatsobvisa kupisa muhutano hwepamusoro uye kudzivirira kupisa kwenzvimbo.
Zvingango shandiswa:
• Gallium Nitride (GaN) uye Silicon Carbide epitaxial CVD reactor components zvinosanganisira wafer carriers, satellite dish, showerheads, siringi, uye susceptors.
• Silicon carbide, gallium nitride uye aluminum nitride (AlN) crystal growth components zvinosanganisira crucibles, vabati vembeu, gidhi ringi nemasefa.
• Zvikamu zveindasitiri zvinosanganisira kuramba kudziyisa zvinhu, jekiseni nozzles, masking mhete uye brazing jigs
Zvishandiso zvekushandisa:
• Tembiricha yakagadzikana pamusoro pe2000 ° C, ichibvumira kushanda pakupisa kwakanyanya
•Inopikisa hydrogen (Hz), ammonia (NH3), monosilane (SiH4) nesilicon (Si), ichidzivirira munzvimbo dzakaoma dzemakemikari.
• Thermal shock resistance inogonesa kukurumidza kushanda kutenderera
• Graphite ine kunamatira kwakasimba, kuve nechokwadi chehupenyu hurefu hwebasa uye pasina coating delamination.
• Ultra-yakakwirira kuchena kubvisa kusvibiswa kusingakoshi kana kusvibiswa
• Conformal coating coverage to tight dimensional tolerances
Zvido zvehunyanzvi:
Kugadzirira kwe dense tantalum carbide coatings neCVD:
TAC yekupfekedza ine yakakwira crystallinity uye yakanakisa kufanana:
CVD TAC COATING Technical Parameters_Semicera:
| Zvenyama zvimiro zveTaC coating | |
| Density | 14.3 (g/cm³) |
| Bulk Concentration | 8 x 1015/cm |
| Specific emssivity | 0.3 |
| Thermal kuwedzera coefficient | 6.3 10-6/K |
| Kuoma (HK) | 2000 HK |
| Bulk Resistivity | 4.5 ohm-cm |
| Resistance | 1x10-5Om*cm |
| Thermal kugadzikana | <2500℃ |
| Mobility | 237 cm2/Vs |
| Graphite saizi inoshanduka | -10 ~ -20um |
| Coating ukobvu | ≥20um yakajairika kukosha (35um+10um) |
Zviri pamusoro apa ndiwo maitiro akajairika.
