CVD TaC Coating

 

Nhanganyaya kuCVD TaC Coating:

 

CVD TaC Coating i tekinoroji inoshandisa kemikari vapor deposition kuisa tantalum carbide (TaC) yekuputira pamusoro pe substrate. Tantalum carbide ndeyepamusoro-inoshanda ceramic zvinhu ine yakanakisa mechaniki uye makemikari zvimiro. Iyo CVD maitiro inogadzira yunifomu yeTaC firimu pamusoro peiyo substrate kuburikidza negasi maitiro.

 

Main features:

 

Excellent kuoma uye kupfeka kuramba: Tantalum carbide ine kuomarara kwakanyanya, uye CVD TaC Coating inogona kuvandudza zvakanyanya kupfeka kuramba kweiyo substrate. Izvi zvinoita kuti iyo yekuputira ive yakanaka kune maapplication munzvimbo dzepamusoro-soro, senge maturusi ekucheka uye mold.

High Temperature Kugadzikana: TaC coatings inodzivirira yakakosha choto uye reactor zvikamu pakupisa kusvika ku2200 ° C, zvichiratidza kugadzikana kwakanaka. Inochengetedza kugadzikana kwemakemikari uye mechanical pasi pemamiriro ekushisa kwakanyanya, zvichiita kuti ive yakakodzera kune-high-temperature yekugadzirisa uye kushandiswa munzvimbo dzepamusoro-soro.

Yakanakisa kugadzikana kwemakemikari: Tantalum carbide ine yakasimba corrosion resistance kune akawanda acids uye alkalis, uye CVD TaC Coating inogona kudzivirira zvinobudirira kukanganisa kune substrate munzvimbo dzinoparadza.

High melting point: Tantalum carbide ine nzvimbo yakakwirira yekunyunguduka (inenge 3880 ° C), ichibvumira CVD TaC Coating kuti ishandiswe mumamiriro ekupisa kwepamusoro pasina kunyunguduka kana kukanganisa.

Excellent thermal conductivity: TaC coating ine high thermal conductivity, iyo inobatsira kunyatsobvisa kupisa muhutano hwepamusoro uye kudzivirira kupisa kwenzvimbo.

 

Zvingango shandiswa:

 

• Gallium Nitride (GaN) uye Silicon Carbide epitaxial CVD reactor components zvinosanganisira wafer carriers, satellite dish, showerheads, sirin'i, uye susceptors.

• Silicon carbide, gallium nitride uye aluminum nitride (AlN) crystal growth components zvinosanganisira crucibles, vabati vembeu, gidhi ringi nemasefa.

• Zvikamu zveindasitiri zvinosanganisira kuramba kudziyisa zvinhu, jekiseni nozzles, masking mhete uye brazing jigs

 

Zvishandiso zvekushandisa:

 

• Tembiricha yakagadzikana pamusoro pe2000 ° C, ichibvumira kushanda pakupisa kwakanyanya
•Inopikisa hydrogen (Hz), ammonia (NH3), monosilane (SiH4) nesilicon (Si), inopa dziviriro munzvimbo dzakaoma dzemakemikari.
• Thermal shock resistance inogonesa kukurumidza kushanda kutenderera
• Graphite ine kunamatira kwakasimba, kuve nechokwadi chehupenyu hurefu hwebasa uye pasina coating delamination.
• Ultra-yakakwirira kuchena kubvisa kusvibiswa kusingakoshi kana kusvibiswa
• Conformal coating coverage to tight dimensional tolerances

 

Zvido zvehunyanzvi:

 

Kugadzirira kwe dense tantalum carbide coatings neCVD:

 Tantalum Carbide Coting By CVD Method

TAC yekupfekedza ine yakakwira crystallinity uye yakanakisa kufanana:

 TAC yekupfeka ine yakakwira crystallinity uye yakanakisa kufanana

 

 

CVD TAC COATING Technical Parameters_Semicera:

 

 CVD TAC COATING Technical Parameters_Semicera

Zviri pamusoro apa ndiwo maitiro akajairika.