Ga2O3 Epitaxy

Tsanangudzo Pfupi:

Ga2O3Epitaxy-Simbisa yako yepamusoro-simba zvemagetsi uye optoelectronic zvishandiso neSemicera's Ga2O3Epitaxy, inopa kuita kusingaenzaniswi uye kuvimbika kwepamusoro semiconductor application.


Product Detail

Product Tags

Semicerazvinodadisa inopaGa2O3Epitaxy, sarudzo yemazuva ano yakagadzirirwa kusundira miganhu yemagetsi emagetsi uye optoelectronics. Iyi yepamusoro epitaxial tekinoroji inosimudzira yakasarudzika zvivakwa zveGallium Oxide (Ga2O3) kuendesa kushanda kwepamusoro mukukumbira zvikumbiro.

Zvinokosha:

• Exceptional Wide Bandgap: Ga2O3Epitaxyine Ultra-wide bandgap, inobvumira kuparara kwepamusoro uye kushanda kwakanaka munzvimbo dzine simba guru.

High Thermal Conductivity: Iyo epitaxial layer inopa yakanakisa thermal conductivity, kuve nechokwadi chekushanda kwakagadzikana kunyange pasi pemamiriro ekunze ekupisa, zvichiita kuti ive yakanaka kune yakakwirira-frequency zvishandiso.

Superior Material Quality: Wana high crystal quality ine hurema hushoma, kuve nechokwadi chekushanda kwechigadzirwa uye hupenyu hurefu, kunyanya mumashandisirwo akaoma akadai semagetsi transistors uye UV detectors.

Kusiyana-siyana muMaapplication: Yakanyatsokodzera magetsi emagetsi, RF zvikumbiro, uye optoelectronics, ichipa hwaro hwakavimbika hwechinotevera-chizvarwa semiconductor zvishandiso.

 

Ziva kugona kweGa2O3EpitaxyneSemicera's innovative solutions. Zvigadzirwa zvedu zveepitaxial zvakagadzirirwa kusangana nemhando yepamusoro yemhando uye mashandiro, zvichiita kuti zvishandiso zvako zvishande nekubudirira kwakanyanya uye kuvimbika. Sarudza Semicera yekucheka-kumucheto semiconductor tekinoroji.

Items

Kugadzirwa

Tsvakurudzo

Dummy

Crystal Parameters

Polytype

4H

Kutadza kwekutarisa pamusoro

<11-20 >4±0.15°

Electrical Parameters

Dopant

n-mhando Nitrogen

Resistivity

0.015-0.025ohm·cm

Mechanical Parameters

Diameter

150.0±0.2mm

Ukobvu

350±25 μm

Primary flat orientation

[1-100]±5°

Primary flat urefu

47.5±1.5mm

Secondary flat

Hapana

TTV

≤5 μm

≤10 μm

≤15 μm

LTV

≤3 μm(5mm*5mm)

≤5 μm(5mm*5mm)

≤10 μm(5mm*5mm)

Bow

-15μm ~ 15μm

-35μm ~ 35μm

-45μm ~ 45μm

Warp

≤35 μm

≤45 μm

≤55 μm

Mberi(Si-face) roughness(AFM)

Ra≤0.2nm (5μm*5μm)

Chimiro

Micropipe density

<1 pa/cm2

<10 ea/cm2

<15 ea/cm2

Metal tsvina

≤5E10atomu/cm2

NA

BPD

≤1500 ea/cm2

≤3000 ea/cm2

NA

TSD

≤500 ea/cm2

≤1000 ea/cm2

NA

Mberi Hunhu

Mberi

Si

Surface finish

Si-face CMP

Zvimedu

≤60ea/wafer (saizi≥0.3μm)

NA

Makwara

≤5ea/mm. Kureba kwekuwedzera ≤Diameter

Cumulative kureba≤2*Diameter

NA

Orenji svuura/makomba/mavara/mitsetse/pakatsemuka/kusvibiswa

Hapana

NA

Edge chips/indents/fracture/hex plates

Hapana

Polytype nzvimbo

Hapana

Cumulative area≤20%

Cumulative area≤30%

Front laser marking

Hapana

Back Quality

Back finish

C-chiso CMP

Makwara

≤5ea/mm,Cumulative kureba≤2*Diameter

NA

Kuremara kumashure (kumucheto machipisi / indents)

Hapana

Back roughness

Ra≤0.2nm (5μm*5μm)

Back laser marking

1 mm (kubva kumusoro kumucheto)

Edge

Edge

Chamfer

Packaging

Packaging

Epi-yakagadzirira ine vacuum packaging

Multi-wafer kaseti kurongedza

* Notes: "NA" zvinoreva kuti hapana chikumbiro Zvinhu zvisina kutaurwa zvinogona kureva SEMI-STD.

tech_1_2_size
SiC wafers

  • Zvakapfuura:
  • Zvinotevera: